Company Germany
These fully automatic systems can operate in both, thermal CVD and plasma enhanced CVD modes. This is highly important for carbon nanomaterials as it enables our equipment to produce virtually all variations and morphologies of carbon nanotubes and nanofibers. For the deposition of III-V and II-VI semiconducting nanowires, systems based on Close Coupled Showerhead technology or Horizontal Flow reactor technology are used. These systems are capable of producing nanowires with sharp material transition interfaces along its axis, as well as coaxial nanowires. |
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