Research Centre Canada Background Self-assembled monolayers (SAMs) are considered a platform for uses in many fields, such as biosensors, surface engineering and surface model systems. To date, there is only one compound (Octadecyltrichlorosilane or OTS) that can form a complete monolayer on Si. This is due to the particular ability of OTS to polymerize. Octadecylphosphonic acid (OPA) has till now been reported in the literature to form only incomplete SAMs on mica substrate. Description of the Invention The scientists have developed a reproducible process for fabricating a complete and apparently defect-free OPA monolayer on silicaceous, aluminum and other metal oxide surfaces. This finding has potential uses in nanometer-scale surface engineering and other applications where an organic monolayer is required (production of starting layers in nanolithography, next-generation photomasks for microelectronics, complete coatings of formed metals such as hard drive platters or architectural aluminum). Advantages The present invention offers a number of competitive advantages, including: 1. The ability to control the morphology of OPA SAMs, not only on a model mica substrate but also on other industrially important and useful substrates such as silicon wafers, quartz, sapphire and metallic surfaces. 2. The attachment of the SAM to the substrate, which is found to be molecular and robust under mechanical and chemical trials. Tests show that the nature of the interaction between OPA SAM and the substrate is dependent on the substrate. Potential Applications This opportunity will be of interest to nanotechnology companies, biotech companies, and the electronics and semiconductor industries. Potential applications include:
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